Formation of ultra-thin quantum dot films by mist deposition

S. C. Price; K. Shanmugasundaram; T. Zhu; F. Zhang; J. Xu; S. E. Mohney; Q. Zhang; J. Ruzyllo

doi:10.1149/1.2783306

Formation of ultra-thin quantum dot films by mist deposition

S. C. Price, K. Shanmugasundaram, T. Zhu, F. Zhang, J. Xu, S. E. Mohney, Q. Zhang, J. Ruzyllo

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Films of CdSe colloidal semiconductor quantum dots were deposited on several substrates including bare silicon, silicon dioxide, aluminum, and ITO coated glass using mist deposition. The process parameters, including deposition time, solution concentration, and electric field, were varied to change the thickness of the deposited film. Blanket films and films deposited through a shadow mask were created to investigate the method's ability to pattern films during the deposition process. Smooth films were formed with thicknesses from about 39 nm, or 7 monolayers, to a single layer. The results show that mist deposition of quantum dots is a viable method for creating thin quantum dot films.

Original language	English (US)
Title of host publication	ECS Transactions - Nanoscale One-Dimensional Electronic and Photonic Devices, NODEPD
Publisher	Electrochemical Society Inc.
Pages	89-94
Number of pages	6
Edition	8
ISBN (Electronic)	9781566775748
ISBN (Print)	9781604238938
DOIs	https://doi.org/10.1149/1.2783306
State	Published - 2007
Event	1st Nanoscale One-Dimensional Electronic and Photonic Devices, NODEPD - 212th ECS Meeting - Washington, DC, United States Duration: Oct 7 2007 → Oct 12 2007

Publication series

Name	ECS Transactions
Number	8
Volume	11
ISSN (Print)	1938-5862
ISSN (Electronic)	1938-6737

Other

Other	1st Nanoscale One-Dimensional Electronic and Photonic Devices, NODEPD - 212th ECS Meeting
Country/Territory	United States
City	Washington, DC
Period	10/7/07 → 10/12/07

All Science Journal Classification (ASJC) codes

General Engineering

Access to Document

10.1149/1.2783306

Cite this

Price, S. C., Shanmugasundaram, K., Zhu, T., Zhang, F., Xu, J., Mohney, S. E., Zhang, Q., & Ruzyllo, J. (2007). Formation of ultra-thin quantum dot films by mist deposition. In ECS Transactions - Nanoscale One-Dimensional Electronic and Photonic Devices, NODEPD (8 ed., pp. 89-94). (ECS Transactions; Vol. 11, No. 8). Electrochemical Society Inc.. https://doi.org/10.1149/1.2783306

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title = "Formation of ultra-thin quantum dot films by mist deposition",

abstract = "Films of CdSe colloidal semiconductor quantum dots were deposited on several substrates including bare silicon, silicon dioxide, aluminum, and ITO coated glass using mist deposition. The process parameters, including deposition time, solution concentration, and electric field, were varied to change the thickness of the deposited film. Blanket films and films deposited through a shadow mask were created to investigate the method's ability to pattern films during the deposition process. Smooth films were formed with thicknesses from about 39 nm, or 7 monolayers, to a single layer. The results show that mist deposition of quantum dots is a viable method for creating thin quantum dot films.",

author = "Price, {S. C.} and K. Shanmugasundaram and T. Zhu and F. Zhang and J. Xu and Mohney, {S. E.} and Q. Zhang and J. Ruzyllo",

note = "Copyright: Copyright 2011 Elsevier B.V., All rights reserved.; 1st Nanoscale One-Dimensional Electronic and Photonic Devices, NODEPD - 212th ECS Meeting ; Conference date: 07-10-2007 Through 12-10-2007",

year = "2007",

doi = "10.1149/1.2783306",

language = "English (US)",

isbn = "9781604238938",

series = "ECS Transactions",

publisher = "Electrochemical Society Inc.",

number = "8",

pages = "89--94",

booktitle = "ECS Transactions - Nanoscale One-Dimensional Electronic and Photonic Devices, NODEPD",

edition = "8",

}

Price, SC, Shanmugasundaram, K, Zhu, T, Zhang, F, Xu, J , Mohney, SE, Zhang, Q & Ruzyllo, J 2007, Formation of ultra-thin quantum dot films by mist deposition. in ECS Transactions - Nanoscale One-Dimensional Electronic and Photonic Devices, NODEPD. 8 edn, ECS Transactions, no. 8, vol. 11, Electrochemical Society Inc., pp. 89-94, 1st Nanoscale One-Dimensional Electronic and Photonic Devices, NODEPD - 212th ECS Meeting, Washington, DC, United States, 10/7/07. https://doi.org/10.1149/1.2783306

Formation of ultra-thin quantum dot films by mist deposition. / Price, S. C.; Shanmugasundaram, K.; Zhu, T. et al.
ECS Transactions - Nanoscale One-Dimensional Electronic and Photonic Devices, NODEPD. 8. ed. Electrochemical Society Inc., 2007. p. 89-94 (ECS Transactions; Vol. 11, No. 8).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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T1 - Formation of ultra-thin quantum dot films by mist deposition

AU - Price, S. C.

AU - Shanmugasundaram, K.

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AU - Zhang, Q.

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N2 - Films of CdSe colloidal semiconductor quantum dots were deposited on several substrates including bare silicon, silicon dioxide, aluminum, and ITO coated glass using mist deposition. The process parameters, including deposition time, solution concentration, and electric field, were varied to change the thickness of the deposited film. Blanket films and films deposited through a shadow mask were created to investigate the method's ability to pattern films during the deposition process. Smooth films were formed with thicknesses from about 39 nm, or 7 monolayers, to a single layer. The results show that mist deposition of quantum dots is a viable method for creating thin quantum dot films.

AB - Films of CdSe colloidal semiconductor quantum dots were deposited on several substrates including bare silicon, silicon dioxide, aluminum, and ITO coated glass using mist deposition. The process parameters, including deposition time, solution concentration, and electric field, were varied to change the thickness of the deposited film. Blanket films and films deposited through a shadow mask were created to investigate the method's ability to pattern films during the deposition process. Smooth films were formed with thicknesses from about 39 nm, or 7 monolayers, to a single layer. The results show that mist deposition of quantum dots is a viable method for creating thin quantum dot films.

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Formation of ultra-thin quantum dot films by mist deposition

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