Gradient solvent vapor annealing of block copolymer thin films using a microfluidic mixing device

Julie N.L. Albert; Timothy D. Bogart; Ronald L. Lewis; Kathryn L. Beers; Michael J. Fasolka; J. Brian Hutchison; Bryan D. Vogt; Thomas H. Epps

doi:10.1021/nl104496r

Gradient solvent vapor annealing of block copolymer thin films using a microfluidic mixing device

Julie N.L. Albert, Timothy D. Bogart, Ronald L. Lewis, Kathryn L. Beers, Michael J. Fasolka, J. Brian Hutchison, Bryan D. Vogt, Thomas H. Epps

Chemical Engineering

Research output: Contribution to journal › Article › peer-review

98 Scopus citations

Abstract

Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using this device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.

Original language	English (US)
Pages (from-to)	1351-1357
Number of pages	7
Journal	Nano letters
Volume	11
Issue number	3
DOIs	https://doi.org/10.1021/nl104496r
State	Published - Mar 9 2011

All Science Journal Classification (ASJC) codes

Bioengineering
General Chemistry
General Materials Science
Condensed Matter Physics
Mechanical Engineering

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10.1021/nl104496r

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abstract = "Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using this device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.",

author = "Albert, {Julie N.L.} and Bogart, {Timothy D.} and Lewis, {Ronald L.} and Beers, {Kathryn L.} and Fasolka, {Michael J.} and Hutchison, {J. Brian} and Vogt, {Bryan D.} and Epps, {Thomas H.}",

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AU - Albert, Julie N.L.

AU - Bogart, Timothy D.

AU - Lewis, Ronald L.

AU - Beers, Kathryn L.

AU - Fasolka, Michael J.

AU - Hutchison, J. Brian

AU - Vogt, Bryan D.

AU - Epps, Thomas H.

PY - 2011/3/9

Y1 - 2011/3/9

N2 - Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using this device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.

AB - Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using this device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.

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Gradient solvent vapor annealing of block copolymer thin films using a microfluidic mixing device

Abstract

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