Gradient solvent vapor annealing of block copolymer thin films using a microfluidic mixing device

Julie N.L. Albert; Timothy D. Bogart; Ronald L. Lewis; Kathryn L. Beers; Michael J. Fasolka; J. Brian Hutchison; Bryan D. Vogt; Thomas H. Epps

doi:10.1021/nl104496r

Gradient solvent vapor annealing of block copolymer thin films using a microfluidic mixing device

Julie N.L. Albert
, Timothy D. Bogart
, Ronald L. Lewis
, Kathryn L. Beers
, Michael J. Fasolka
, J. Brian Hutchison
, Bryan D. Vogt
, Thomas H. Epps

Chemical Engineering

Research output: Contribution to journal › Article › peer-review

100 Scopus citations

Abstract

Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using this device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.

Original language	English (US)
Pages (from-to)	1351-1357
Number of pages	7
Journal	Nano letters
Volume	11
Issue number	3
DOIs	https://doi.org/10.1021/nl104496r
State	Published - Mar 9 2011

All Science Journal Classification (ASJC) codes

Bioengineering
General Chemistry
General Materials Science
Condensed Matter Physics
Mechanical Engineering

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10.1021/nl104496r

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title = "Gradient solvent vapor annealing of block copolymer thin films using a microfluidic mixing device",

abstract = "Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using this device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.",

author = "Albert, \{Julie N.L.\} and Bogart, \{Timothy D.\} and Lewis, \{Ronald L.\} and Beers, \{Kathryn L.\} and Fasolka, \{Michael J.\} and Hutchison, \{J. Brian\} and Vogt, \{Bryan D.\} and Epps, \{Thomas H.\}",

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AU - Albert, Julie N.L.

AU - Bogart, Timothy D.

AU - Lewis, Ronald L.

AU - Beers, Kathryn L.

AU - Fasolka, Michael J.

AU - Hutchison, J. Brian

AU - Vogt, Bryan D.

AU - Epps, Thomas H.

PY - 2011/3/9

Y1 - 2011/3/9

N2 - Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using this device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.

AB - Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using this device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.

UR - https://www.scopus.com/pages/publications/79952603731

UR - https://www.scopus.com/pages/publications/79952603731#tab=citedBy

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EP - 1357

JO - Nano letters

JF - Nano letters

IS - 3

ER -

Gradient solvent vapor annealing of block copolymer thin films using a microfluidic mixing device

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