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Growth of 6H-SiC crystals with low boron concentration

  • M. A. Fanton
  • , R. L. Cavalero
  • , B. E. Weiland
  • , R. G. Ray
  • , D. W. Snyder
  • , R. D. Gamble
  • , E. J. Oslosky
  • , W. J. Everson

    Research output: Contribution to journalArticlepeer-review

    Abstract

    The effects of growth conditions, diffusion barrier coatings, and alternate hot zone materials on boron incorporation in 6H-SiC boules grown by physical vapor transport were evaluated. Chemical analysis by secondary ion mass spectrometry revealed that commercial source materials combined with standard halogen-purified graphite led to B concentrations on the order of 1.0e17 atoms/cm3. Development of high-purity source material with B concentrations less than 1.8e15 atoms/cm3 subsequently reduced the B concentration in the boule to 3.0e16 atoms/cm3. Application of carbide coatings and the use of pyrolytic graphite components ultimately lead to the growth of SiC boules with B concentrations as low as 2.4e15 atoms/cm 3. Changes in growth temperature (2100-2300 °C) and pressure (5-13.5 Torr) had no measurable effect on B incorporation. Changes in the C/Si ratio due to source graphitization and addition of hydrogen gas to the growth atmosphere also had no effect on B incorporation.

    Original languageEnglish (US)
    Pages (from-to)363-366
    Number of pages4
    JournalJournal of Crystal Growth
    Volume287
    Issue number2
    DOIs
    StatePublished - Jan 25 2006

    All Science Journal Classification (ASJC) codes

    • Condensed Matter Physics
    • Inorganic Chemistry
    • Materials Chemistry

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