High-pressure chemical deposition for void-free filling of extreme aspect ratio templates

Justin R. Sparks; Neil F. Baril; Banafsheh Keshavarzi; Mahesh Krishnamurthi; Ivan Temnykh; Pier J.A. Sazio; Anna C. Peacock; Ali Borhan; Venkatraman Gopalan; John V. Badding

doi:10.1002/adma.201001199

High-pressure chemical deposition for void-free filling of extreme aspect ratio templates

Justin R. Sparks, Neil F. Baril, Banafsheh Keshavarzi, Mahesh Krishnamurthi, Ivan Temnykh, Pier J.A. Sazio, Anna C. Peacock, Ali Borhan, Venkatraman Gopalan, John V. Badding

Research output: Contribution to journal › Article › peer-review

25 Scopus citations

Abstract

Near atomically smooth, void-free, centimeter-long amorphous silicon waveguides are produced by high pressure chemical fluid deposition in the pores of a microstructured optical fiber template (right inset). Semiconductor waveguides fabricated by conventional deposition/fabrication approaches have a surface roughness that is a constraining factor in most optoelectronic devices, but these waveguides conform to the extraordinarily geometrically perfect optical fiber pores (DIC image, bottom inset).

Original language	English (US)
Pages (from-to)	4605-4611
Number of pages	7
Journal	Advanced Materials
Volume	22
Issue number	41
DOIs	https://doi.org/10.1002/adma.201001199
State	Published - Nov 2 2010

All Science Journal Classification (ASJC) codes

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

Access to Document

10.1002/adma.201001199

Cite this

@article{6938b09fad1e4cc891283273663dfd8e,

title = "High-pressure chemical deposition for void-free filling of extreme aspect ratio templates",

abstract = "Near atomically smooth, void-free, centimeter-long amorphous silicon waveguides are produced by high pressure chemical fluid deposition in the pores of a microstructured optical fiber template (right inset). Semiconductor waveguides fabricated by conventional deposition/fabrication approaches have a surface roughness that is a constraining factor in most optoelectronic devices, but these waveguides conform to the extraordinarily geometrically perfect optical fiber pores (DIC image, bottom inset).",

author = "Sparks, {Justin R.} and Baril, {Neil F.} and Banafsheh Keshavarzi and Mahesh Krishnamurthi and Ivan Temnykh and Sazio, {Pier J.A.} and Peacock, {Anna C.} and Ali Borhan and Venkatraman Gopalan and Badding, {John V.}",

year = "2010",

month = nov,

day = "2",

doi = "10.1002/adma.201001199",

language = "English (US)",

volume = "22",

pages = "4605--4611",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-VCH Verlag",

number = "41",

}

TY - JOUR

T1 - High-pressure chemical deposition for void-free filling of extreme aspect ratio templates

AU - Sparks, Justin R.

AU - Baril, Neil F.

AU - Keshavarzi, Banafsheh

AU - Krishnamurthi, Mahesh

AU - Temnykh, Ivan

AU - Sazio, Pier J.A.

AU - Peacock, Anna C.

AU - Borhan, Ali

AU - Gopalan, Venkatraman

AU - Badding, John V.

PY - 2010/11/2

Y1 - 2010/11/2

N2 - Near atomically smooth, void-free, centimeter-long amorphous silicon waveguides are produced by high pressure chemical fluid deposition in the pores of a microstructured optical fiber template (right inset). Semiconductor waveguides fabricated by conventional deposition/fabrication approaches have a surface roughness that is a constraining factor in most optoelectronic devices, but these waveguides conform to the extraordinarily geometrically perfect optical fiber pores (DIC image, bottom inset).

AB - Near atomically smooth, void-free, centimeter-long amorphous silicon waveguides are produced by high pressure chemical fluid deposition in the pores of a microstructured optical fiber template (right inset). Semiconductor waveguides fabricated by conventional deposition/fabrication approaches have a surface roughness that is a constraining factor in most optoelectronic devices, but these waveguides conform to the extraordinarily geometrically perfect optical fiber pores (DIC image, bottom inset).

UR - http://www.scopus.com/inward/record.url?scp=78149447879&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=78149447879&partnerID=8YFLogxK

U2 - 10.1002/adma.201001199

DO - 10.1002/adma.201001199

M3 - Article

C2 - 20827671

AN - SCOPUS:78149447879

SN - 0935-9648

VL - 22

SP - 4605

EP - 4611

JO - Advanced Materials

JF - Advanced Materials

IS - 41

ER -

High-pressure chemical deposition for void-free filling of extreme aspect ratio templates

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this