High-pressure chemical deposition for void-free filling of extreme aspect ratio templates

Justin R. Sparks; Neil F. Baril; Banafsheh Keshavarzi; Mahesh Krishnamurthi; Ivan Temnykh; Pier J.A. Sazio; Anna C. Peacock; Ali Borhan; Venkatraman Gopalan; John V. Badding

doi:10.1002/adma.201001199

High-pressure chemical deposition for void-free filling of extreme aspect ratio templates

Justin R. Sparks
, Neil F. Baril
, Banafsheh Keshavarzi
, Mahesh Krishnamurthi
, Ivan Temnykh
, Pier J.A. Sazio
, Anna C. Peacock
, Ali Borhan
, Venkatraman Gopalan
, John V. Badding

Research output: Contribution to journal › Article › peer-review

27 Scopus citations

Abstract

Near atomically smooth, void-free, centimeter-long amorphous silicon waveguides are produced by high pressure chemical fluid deposition in the pores of a microstructured optical fiber template (right inset). Semiconductor waveguides fabricated by conventional deposition/fabrication approaches have a surface roughness that is a constraining factor in most optoelectronic devices, but these waveguides conform to the extraordinarily geometrically perfect optical fiber pores (DIC image, bottom inset).

Original language	English (US)
Pages (from-to)	4605-4611
Number of pages	7
Journal	Advanced Materials
Volume	22
Issue number	41
DOIs	https://doi.org/10.1002/adma.201001199
State	Published - Nov 2 2010

All Science Journal Classification (ASJC) codes

General Materials Science
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.201001199

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@article{6938b09fad1e4cc891283273663dfd8e,

title = "High-pressure chemical deposition for void-free filling of extreme aspect ratio templates",

abstract = "Near atomically smooth, void-free, centimeter-long amorphous silicon waveguides are produced by high pressure chemical fluid deposition in the pores of a microstructured optical fiber template (right inset). Semiconductor waveguides fabricated by conventional deposition/fabrication approaches have a surface roughness that is a constraining factor in most optoelectronic devices, but these waveguides conform to the extraordinarily geometrically perfect optical fiber pores (DIC image, bottom inset).",

author = "Sparks, \{Justin R.\} and Baril, \{Neil F.\} and Banafsheh Keshavarzi and Mahesh Krishnamurthi and Ivan Temnykh and Sazio, \{Pier J.A.\} and Peacock, \{Anna C.\} and Ali Borhan and Venkatraman Gopalan and Badding, \{John V.\}",

year = "2010",

month = nov,

day = "2",

doi = "10.1002/adma.201001199",

language = "English (US)",

volume = "22",

pages = "4605--4611",

journal = "Advanced Materials",

issn = "0935-9648",

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}

TY - JOUR

T1 - High-pressure chemical deposition for void-free filling of extreme aspect ratio templates

AU - Sparks, Justin R.

AU - Baril, Neil F.

AU - Keshavarzi, Banafsheh

AU - Krishnamurthi, Mahesh

AU - Temnykh, Ivan

AU - Sazio, Pier J.A.

AU - Peacock, Anna C.

AU - Borhan, Ali

AU - Gopalan, Venkatraman

AU - Badding, John V.

PY - 2010/11/2

Y1 - 2010/11/2

N2 - Near atomically smooth, void-free, centimeter-long amorphous silicon waveguides are produced by high pressure chemical fluid deposition in the pores of a microstructured optical fiber template (right inset). Semiconductor waveguides fabricated by conventional deposition/fabrication approaches have a surface roughness that is a constraining factor in most optoelectronic devices, but these waveguides conform to the extraordinarily geometrically perfect optical fiber pores (DIC image, bottom inset).

AB - Near atomically smooth, void-free, centimeter-long amorphous silicon waveguides are produced by high pressure chemical fluid deposition in the pores of a microstructured optical fiber template (right inset). Semiconductor waveguides fabricated by conventional deposition/fabrication approaches have a surface roughness that is a constraining factor in most optoelectronic devices, but these waveguides conform to the extraordinarily geometrically perfect optical fiber pores (DIC image, bottom inset).

UR - https://www.scopus.com/pages/publications/78149447879

UR - https://www.scopus.com/pages/publications/78149447879#tab=citedBy

U2 - 10.1002/adma.201001199

DO - 10.1002/adma.201001199

M3 - Article

C2 - 20827671

AN - SCOPUS:78149447879

SN - 0935-9648

VL - 22

SP - 4605

EP - 4611

JO - Advanced Materials

JF - Advanced Materials

IS - 41

ER -

High-pressure chemical deposition for void-free filling of extreme aspect ratio templates

Abstract

All Science Journal Classification (ASJC) codes

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