High speed anisotropic etching of quartz using SF 6/C 4F 8/Ar/O 2 based chemistry in inductively coupled plasma reactive ion etching system

Abhijat Goyal, Vincent Hood, Srinivas A. Tadigadapa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Scopus citations

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Mathematics

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds