High speed anisotropic etching of quartz using SF 6/C 4F 8/Ar/O 2 based chemistry in inductively coupled plasma reactive ion etching system

Abhijat Goyal, Vincent Hood, Srinivas A. Tadigadapa

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

6 Scopus citations

Fingerprint

Dive into the research topics of 'High speed anisotropic etching of quartz using SF 6/C 4F 8/Ar/O 2 based chemistry in inductively coupled plasma reactive ion etching system'. Together they form a unique fingerprint.

Material Science

Keyphrases

Engineering