The molecular-ruler nanolithography process was used to create photolithographic structures with precise controllable nanometer-scale spacings. This process utilized the selective placement and controlled thickness of self-assembled multilayers to form precise molecular-ruler resists. Some of the advantages of the process include the features of high-resolution and precision, selective deposition, compatibility with different forms of lithographic processing, low production cost, and mild processing conditions. The precise molecular-ruler resists were used to define nanometer-scale spacings between initial and subsequently registered photolithographically patterned structures. Parallel hybrid methodologies used two techniques in combination to fabricate structures that interface nanometer- and micrometer-scale components.
All Science Journal Classification (ASJC) codes
- General Materials Science
- Mechanics of Materials
- Mechanical Engineering