Abstract
We show, for the first time, that E′ like centers can be generated in hot hole stressing of short channel metal oxide silicon field effect transistors (MOSFETs). Prior to this study only Pb centers had been directly linked to this stressing phenomenon.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 181-184 |
| Number of pages | 4 |
| Journal | Materials Research Society Symposium - Proceedings |
| Volume | 473 |
| DOIs | |
| State | Published - 1997 |
| Event | Proceedings of the 1997 MRS Spring Symposium - San Francisco, CA, USA Duration: Mar 31 1997 → Apr 3 1997 |
All Science Journal Classification (ASJC) codes
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering
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