Keyphrases
Heterostructure
100%
Ferroelectric Properties
100%
Remanent Polarization
100%
Bottom Electrode
100%
Leakage Current Density
100%
Change Impact
100%
In Films
50%
Crystallinity
50%
Microstructure
50%
Si Substrate
50%
Surface Roughness
50%
Low Voltage
50%
Annealing Temperature
50%
Electrode-electrolyte Interface
50%
TiO2-SiO2
50%
Pt-TiO2
50%
Interface Roughness
50%
Electrode Surface
50%
Electrode Roughness
50%
Polarization Current
50%
Film Electrode
50%
ZrO2-SiO2
50%
Out-diffusion
50%
Film Orientation
50%
Low Leakage Current
50%
Current Density-voltage
50%
Material Science
Film
100%
Thin Films
100%
Heterojunction
100%
Ferroelectricity
100%
Density
40%
Surface Roughness
20%
Zirconia
20%
Titanium Dioxide
20%
Engineering
Thin Films
100%
Heterojunctions
100%
Crystallinity
50%
Si Substrate
50%
Annealing Temperature
50%
Film Orientation
50%