In situ measurement of increased ferroelectric/ferroelastic domain wall motion in declamped tetragonal lead zirconate titanate thin films

M. Wallace, R. L. Johnson-Wilke, G. Esteves, C. M. Fancher, R. H.T. Wilke, J. L. Jones, S. Trolier-Mckinstry

Research output: Contribution to journalArticlepeer-review

41 Scopus citations

Abstract

Ferroelectric/ferroelastic domain reorientation was measured in a 1.9μm thick tetragonal {001} oriented PbZr0.3Ti0.7O3 thin film doped with 1% Mn under different mechanical boundary constraints. Domain reorientation was quantified through the intensity changes in the 002/200 Bragg reflections as a function of applied electric field. To alter the degree of clamping, films were undercut from the underlying substrate by 0%, ∼25%, ∼50%, or ∼75% of the electrode area. As the amount of declamping from the substrate increased from 0% to ∼75%, the degree of ferroelectric/ferroelastic domain reorientation in the films increased more than six fold at three times the coercive field. In a film that was ∼75% released from the substrate, approximately 26% of 90° domains were reoriented under the maximum applied field; this value for domain reorientation compares favorably to bulk ceramics of similar compositions. An estimate for the upper limit of 90° domain reorientation in a fully released film under these conditions was determined to be 32%. It was also found that the different clamping conditions strongly influence the amount of reorientation upon removing the applied field, with higher remanence of preferred domain orientations observed in declamped films.

Original languageEnglish (US)
Article number054103
JournalJournal of Applied Physics
Volume117
Issue number5
DOIs
StatePublished - Feb 7 2015

All Science Journal Classification (ASJC) codes

  • General Physics and Astronomy

Fingerprint

Dive into the research topics of 'In situ measurement of increased ferroelectric/ferroelastic domain wall motion in declamped tetragonal lead zirconate titanate thin films'. Together they form a unique fingerprint.

Cite this