Influence of impurities on mechanisms of growth in MOVPE GaAs

S. Nayak, J. M. Redwing, J. W. Huang, M. G. Lagally, T. F. Kuech

Research output: Contribution to journalConference articlepeer-review

6 Scopus citations


Atomic force microscopy (AFM) has been used to investigate the atomic-scale mechanisms of growth of GaAs by metal organic vapor phase epitaxy (MOVPE). The influence of impurities such as silicon, oxygen and carbon on the small-scale periodic structure as well as on the large-scale features has been studied. The growth front of GaAs epitaxial films grown on vicinal GaAs (100) substrates exhibits periodic structure except for the Si doped GaAs grown on semi-insulating vicinal GaAs (100) substrates. The periodicity on the surface breaks down when oxygen, silicon or carbon concentration exceeds 1018cm-3. These impurities may preferentially attach at the step edges resulting in reduction of the mobility of the steps. At higher impurity concentrations, the motion of the growth front gets pinned on the surface resulting in a disruption of the step flow mode of growth. The wide terraces on Si doped GaAs grown on semi-insulating substrate is proposed as the kinetic limited step bunching during the step flow mode of growth.

Original languageEnglish (US)
Pages (from-to)293-298
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
StatePublished - 1995
EventProceedings of the 1994 MRS Fall Meeting - Boston, MA, USA
Duration: Nov 28 1994Dec 2 1994

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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