Influence of reactive sputter deposition conditions on crystallization of zirconium oxide thin films

Engineering

• Amorphous Phase 50%
• Broad Range 50%
• Crystallinity 50%
• Crystallite Size 100%
• Deposition Condition 100%
• Deposition Parameter 50%
• Deposition Rate 50%
• Frequency Source 100%
• Ion Energy 50%
• Magnetron 50%
• Monoclinic 50%
• Oxygen Content 50%
• Physical Parameter 50%
• Radio Frequency 100%
• Ray Diffraction 100%
• Substrate Material 50%
• Substrate Temperature 100%
• Thin Films 100%

Keyphrases

• Oxygen-deficient Zirconia 33%
• Polyphase 33%
• Radio Frequency Source 33%
• Radio Frequency Sputtering 33%
• Reactive Sputter Deposition 100%
• Sputtering Growth 33%
• Sputtering Modes 33%
• Sputtering Parameters 33%
• Sputtering Power 100%
• Sputtering Pressure 100%
• Zirconium Target 33%

Material Science

• Radio Frequency Sputtering 20%