TY - GEN
T1 - Inkjet printing techniques for the fabrication of polymer optical waveguides
AU - Vacirca, Nicholas A.
AU - Kurzweg, Timothy P.
PY - 2010
Y1 - 2010
N2 - A great deal of attention in recent years has been given to inkjet printing as an alternative to traditional lithographic techniques due to its potential for low cost and rapid turnaround fabrication. A Dimatix DMP-2831 materials printer is used to inkjet print polymer waveguides of SU-8 negative photoresist. Several obstacles must be overcome for the technology to be feasible on a large scale including the development of capable print devices, suitable materials for printing, and the ability to consistently and precisely print high-aspect-ratio geometries. We will discuss the inkjet printing fabrication process, explore some of the difficulties encountered through the method, present several of our first prototype waveguides, and report some preliminary results on waveguide characterization.
AB - A great deal of attention in recent years has been given to inkjet printing as an alternative to traditional lithographic techniques due to its potential for low cost and rapid turnaround fabrication. A Dimatix DMP-2831 materials printer is used to inkjet print polymer waveguides of SU-8 negative photoresist. Several obstacles must be overcome for the technology to be feasible on a large scale including the development of capable print devices, suitable materials for printing, and the ability to consistently and precisely print high-aspect-ratio geometries. We will discuss the inkjet printing fabrication process, explore some of the difficulties encountered through the method, present several of our first prototype waveguides, and report some preliminary results on waveguide characterization.
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U2 - 10.1117/12.841436
DO - 10.1117/12.841436
M3 - Conference contribution
AN - SCOPUS:77951520919
SN - 9780819479877
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III
T2 - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III
Y2 - 25 January 2010 through 27 January 2010
ER -