Interface defects in Si/HfO 2-based metal-oxide-semiconductor field-effect transistors

T. G. Pribicko, J. P. Campbell, P. M. Lenahan, W. Tsai, A. Kerber

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Fingerprint

Dive into the research topics of 'Interface defects in Si/HfO 2-based metal-oxide-semiconductor field-effect transistors'. Together they form a unique fingerprint.

Keyphrases

Material Science