Abstract
Nickel is widely used in electrical contacts to InP, especially in NiAuGe ohmic contact to n-type InP. Several researchers have even suggested that the reaction of Ni with InP plays an important role in the ohmic nature of Ni-based contacts. However, numerous discrepancies are found in the literature concerning the Ni/InP reaction. In this study, an examination of the phase equilibria in the Ni-In-P system aids in an interpretation of bulk and thick film diffusion couples, and many of the apparent discrepancies in the literature are clarified. Finally, minor variations in the processing of the contacts (changes in the annealing gas and substrate cleaning procedure) are found in this study to have a less important role in altering the Ni/InP reactions than previous researchers have suggested.
Original language | English (US) |
---|---|
Pages (from-to) | 393-398 |
Number of pages | 6 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 337 |
DOIs | |
State | Published - Jan 1 1994 |
Event | Proceedings of the 1994 MRS Spring Meeting - San Francisco, CA, USA Duration: Apr 5 1994 → Apr 8 1994 |
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering