Investigating the fundamentals of molecular depth profiling using strong-field photoionization of sputtered neutrals

D. Willingham, D. A. Brenes, N. Winograd, A. Wucher

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

Molecular depth profiling of model organic thin films were performed using a 40 keV C60+ cluster ion source in concert with TOF-SIMS. Strong-field photoionization of intact neutral molecules sputtered by 40 keV C60+ primary ions was used to analyze changes in the chemical environment of the guanine thin films as a function of ion fluence. Direct comparison of the secondary ion and neutral components of the molecular depth profiles yields valuable information about chemical damage accumulation as well as changes in the molecular ionization probability. An analytical protocol based on the erosion dynamics model is developed and evaluated using guanine and trehalose molecular secondary ion signals with and without comparable laser photoionization data.

Original languageEnglish (US)
Pages (from-to)45-48
Number of pages4
JournalSurface and Interface Analysis
Volume43
Issue number1-2
DOIs
StatePublished - Jan 2011

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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