Material Science
Aluminum Nitride
100%
Chemical Vapor Deposition
33%
Film
16%
Heterojunction
100%
Josephson Junction
50%
Magnesium Oxide
100%
Pulsed Laser Deposition
16%
Sapphire
16%
Keyphrases
2-layer
7%
AlN Layer
14%
Barrier Materials
7%
Deposition Process
7%
Depositional System
7%
Electrode Layer
7%
Epitaxial
7%
Heterostructure
100%
Hybrid Physical-chemical Vapor Deposition (HPCVD)
14%
In Films
7%
In Situ
7%
Insulator Layer
7%
Josephson Junction
7%
MgB2
100%
Pulsed Laser Deposition
7%
Room Temperature
7%
Sapphire Substrate
7%
SiC Substrate
7%
Structural Properties
7%
Superconducting Properties
14%
Transport Properties
7%
Trilayer
21%
Physics
Josephson Junction
100%
Pulsed Laser Deposition
33%
Room Temperature
33%
Transport Property
33%
Vapor Deposition
66%