Abstract
We report on a horn-shaped electro-optic scanner based on a ferroelectric LiTaO3 wafer that is capable of scanning 632.8-nm light by an unprecedented 14.88° angle for extraordinary polarized light and by 4.05° for ordinary polarized light. The device concept is based on micropatterning ferroelectric domains in the shape of a series of optimized prisms whose refractive index is electric field tunable through the electro-optic effect. We demonstrate what we believe is a novel technique of using electro-optic imaging microscopy for in situ monitoring of the process of domain micropatterning during device fabrication, thus eliminating imperfect process control based on ex situ monitoring of transient currents.
Original language | English (US) |
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Pages (from-to) | 6236-6241 |
Number of pages | 6 |
Journal | Applied optics |
Volume | 40 |
Issue number | 34 |
DOIs | |
State | Published - Dec 1 2001 |
All Science Journal Classification (ASJC) codes
- Atomic and Molecular Physics, and Optics
- Engineering (miscellaneous)
- Electrical and Electronic Engineering