Abstract
We report on a horn-shaped electro-optic scanner based on a ferroelectric LiTaO3 wafer that is capable of scanning 632.8-nm light by an unprecedented 14.88° angle for extraordinary polarized light and by 4.05° for ordinary polarized light. The device concept is based on micropatterning ferroelectric domains in the shape of a series of optimized prisms whose refractive index is electric field tunable through the electro-optic effect. We demonstrate what we believe is a novel technique of using electro-optic imaging microscopy for in situ monitoring of the process of domain micropatterning during device fabrication, thus eliminating imperfect process control based on ex situ monitoring of transient currents.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 6236-6241 |
| Number of pages | 6 |
| Journal | Applied optics |
| Volume | 40 |
| Issue number | 34 |
| DOIs | |
| State | Published - Dec 1 2001 |
All Science Journal Classification (ASJC) codes
- Atomic and Molecular Physics, and Optics
- Engineering (miscellaneous)
- Electrical and Electronic Engineering