Large-area epitaxial graphene: Effect of strain and thickness on electronic properties

Joshua A. Robinson, Mark A. Fanton, Joseph P. Stitt, Thomas Stitt, David Snyder, Eric Frantz, Joseph L. Tedesco, Brenda L. VanMil, Glenn Jernigan, Paul Campbell, Rachael L. Myers-Ward, Charles R. Eddy, D. Kurt Gaskill

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Scopus citations

Abstract

The recent success of graphene transistor operation in the giga-hertz range has solidified the potential of this material for high speed electronic applications.1,2 Realization of a graphene technology on the production scale; however, requires the ability to synthesize large area graphene, and rapidly characterize the material's structural and electronic quality. We report a direct link between carrier mobility and Raman topography of epitaxial graphene grown on silicon carbide. We have examined epitaxial graphene with mobility values of 25-1100 cm2/V-s, and show that the Hall mobility of epitaxial graphene on the Si-face of SiC (SiC(0001)) is not only highly dependent on thickness uniformity, but also on mono-layer strain uniformity. It is not until the thickness and strain uniformity is approaches 50% of the device width that one is able to achieve mobility values higher than 1000 cm2/V-s.

Original languageEnglish (US)
Title of host publicationECS Transactions - Graphene and Emerging Materials for Post-CMOS Applications
PublisherElectrochemical Society Inc.
Pages107-109
Number of pages3
Edition5
ISBN (Electronic)9781607680635
ISBN (Print)9781566777131
DOIs
StatePublished - 2009
Event1st International Symposium on Emerging Materials for Post-CMOS Applications - 215th Meeting of the Electrochemical Society - San Francisco, CA, United States
Duration: May 25 2009May 29 2009

Publication series

NameECS Transactions
Number5
Volume19
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

Other1st International Symposium on Emerging Materials for Post-CMOS Applications - 215th Meeting of the Electrochemical Society
Country/TerritoryUnited States
CitySan Francisco, CA
Period5/25/095/29/09

All Science Journal Classification (ASJC) codes

  • General Engineering

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