Abstract
AlxGa1-xN (x=0-0.25) Schottky rectifiers were fabricated in a lateral geometry employing p+-implanted guard rings and rectifying contact overlap onto an SiO2 passivation layer. The reverse breakdown voltage (VB) increased with the spacing between Schottky and ohmic metal contacts, reaching 9700 V for Al0.25Ga0.75N and 6350 V for GaN, respectively, for 100 μm gap spacing. Assuming lateral depletion, these values correspond to breakdown field strengths of ≤9.67 × 105 V cm-1, which is roughly a factor of 20 lower than the theoretical maximum in bulk GaN. The figure of merit (VB)2/RON, where RON is the on-state resistance, was in the range 94-268 MW cm-2 for all the devices.
Original language | English (US) |
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Pages (from-to) | 823-825 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 78 |
Issue number | 6 |
DOIs | |
State | Published - Feb 5 2001 |
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)