Abstract
A new device structure called the Lateral MIS Tunnel Transistor (LMISTT) is proposed, and its basic features and characteristics are presented. In this device, effects related to the lateral conduction in MIS tunnel structures are implemented. The device is featured by very simple processing, and shows promise in a variety of applications, including very large scale integration high speed IC’s.
Original language | English (US) |
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Pages (from-to) | 197-199 |
Number of pages | 3 |
Journal | IEEE Electron Device Letters |
Volume | 1 |
Issue number | 10 |
DOIs | |
State | Published - Oct 1980 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering