Lateral permittivity patterning by ion irradiation in CdO thin films for mid-IR plasmonics

A. J. Cleri, M. He, J. D. Caldwell, J. P. Maria

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations

Abstract

Donor doped CdO films demonstrate excellent mid-infrared optoelectronic behavior due to tunable transport properties which enable low-loss plasmon resonances between 2-9 μm wavelengths. While doping during deposition determines optical properties throughout the entire film or within film layers, in-plane permittivity control is possible by locally inducing native donor defects through ion irradiation patterning. This novel method creates lateral patterns which are free of physical interfaces but exhibit sharp contrast in permittivity.

Original languageEnglish (US)
Pages (from-to)1205-1206
Number of pages2
JournalInternational Conference on Metamaterials, Photonic Crystals and Plasmonics
StatePublished - 2022
Event12th International Conference on Metamaterials, Photonic Crystals and Plasmonics, META 2022 - Torremolinos, Spain
Duration: Jul 19 2022Jul 22 2022

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Materials Science (miscellaneous)
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry

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