TY - JOUR
T1 - Limiting Spectral Resolution of a Reflection Grating Made via Electron-beam Lithography
AU - Deroo, Casey T.
AU - Termini, Jared
AU - Grisé, Fabien
AU - McEntaffer, Randall L.
AU - Donovan, Benjamin D.
AU - Eichfeld, Chad
N1 - Publisher Copyright:
© 2020. The American Astronomical Society. All rights reserved..
PY - 2020/12/1
Y1 - 2020/12/1
N2 - Gratings enable dispersive spectroscopy from the X-ray to the optical, and feature prominently in proposed flagships and SmallSats alike. The exacting performance requirements of these future missions necessitate assessing whether the present state-of-the-art in grating manufacture will limit spectrometer performance. In this work, we manufacture a 1.5 mm thick, 1000 nm period (1000 gr mm-1) flat grating using electron-beam lithography (EBL), a promising lithographic technique for patterning gratings for future astronomical observatories. We assess the limiting spectral resolution of this grating by interferometrically measuring the diffracted wavefronts produced in ± first order. Our measurements show this grating has a performance of at least R ∼ 14,600, and that our assessment is bounded by the error of our interferometric measurement. The impact of EBL stitching error on grating performance is quantified, and a path to measuring the period error of customized, curved gratings is presented.
AB - Gratings enable dispersive spectroscopy from the X-ray to the optical, and feature prominently in proposed flagships and SmallSats alike. The exacting performance requirements of these future missions necessitate assessing whether the present state-of-the-art in grating manufacture will limit spectrometer performance. In this work, we manufacture a 1.5 mm thick, 1000 nm period (1000 gr mm-1) flat grating using electron-beam lithography (EBL), a promising lithographic technique for patterning gratings for future astronomical observatories. We assess the limiting spectral resolution of this grating by interferometrically measuring the diffracted wavefronts produced in ± first order. Our measurements show this grating has a performance of at least R ∼ 14,600, and that our assessment is bounded by the error of our interferometric measurement. The impact of EBL stitching error on grating performance is quantified, and a path to measuring the period error of customized, curved gratings is presented.
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U2 - 10.3847/1538-4357/abbe15
DO - 10.3847/1538-4357/abbe15
M3 - Article
AN - SCOPUS:85097486892
SN - 0004-637X
VL - 904
JO - Astrophysical Journal
JF - Astrophysical Journal
IS - 2
M1 - 142
ER -