Low-energy hydrogen ion implantation in Schottky barrier control

Keyphrases

• Low Energy 100%
• Dopant Atoms 100%
• Schottky Barrier 100%
• Dopant 100%
• Barrier Control 100%
• Hydrogen Ion Implantation 100%
• Hydrogen Ion 50%
• Ion Beam 50%
• Low Temperature 50%
• Thermal Annealing 50%
• Atomic Hydrogen 50%
• Ion Implantation 50%
• Barrier Height 50%
• Annealing Temperature 50%
• Induced Damage 50%
• Dopant Ions 50%
• Undesirable Effects 50%
• Passivation 50%
• Schottky Barrier Height 50%
• Height Control 50%
• Semiconductor Surface 50%

Material Science

• Doping (Additives) 100%
• Schottky Barrier 100%
• Ion Implantation 100%
• Silicon 20%
• Annealing 20%