Low-frequency noise in MoSe2 field effect transistors

Suprem R. Das, Jiseok Kwon, Abhijith Prakash, Collin J. Delker, Saptarshi Das, David B. Janes

Research output: Contribution to journalArticlepeer-review

47 Scopus citations


One of the important performance metrics of emerging nanoelectronic devices, including low dimensional Field Effect Transistors (FETs), is the magnitude of the low-frequency noise. Atomically thin 2D semiconductor channel materials such as MoX2 (X ≡ S, Se) have shown promising transistor characteristics such as ION/IOFF ratio exceeding 106 and low IOFF, making them attractive as channel materials for next generation nanoelectronic devices. However, MoS2 FETs demonstrated to date exhibit high noise levels under ambient conditions. In this letter, we report at least two orders of magnitude smaller values of Hooge parameter in a back-gated MoSe2 FET (10 atomic layers) with nickel S/D contacts and measured at atmospheric pressure and temperature. The channel dominated regime of noise was extracted from the total noise spectrum and is shown to follow a mobility fluctuation model with 1/f dependence. The low noise in MoSe2 FETs is comparable to other 1D nanoelectronic devices such as carbon nanotube FETs (CNT-FETs) and paves the way for use in future applications in precision sensing and communications.

Original languageEnglish (US)
Article number083507
JournalApplied Physics Letters
Issue number8
StatePublished - Feb 23 2015

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)


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