Abstract
We report on the application of the charge-pumping (CP) technique to vapor-liquid-solid grown silicon nanowire (SiNW) transistors. We use an Ω gate-nanowire field-effect-transistor (OG-NWFET) structure, and we employ a modified CP method that is applicable to three terminal devices. The trap density from CP measurements correlates very well with the results obtained from subthreshold slope measurements. The relatively high trap densities measured and the observed saturation of the CP signal with the measurement frequency are discussed in terms of device dimensions and geometry.
Original language | English (US) |
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Article number | 5604321 |
Pages (from-to) | 871-874 |
Number of pages | 4 |
Journal | IEEE Transactions on Nanotechnology |
Volume | 10 |
Issue number | 4 |
DOIs | |
State | Published - Jul 2011 |
All Science Journal Classification (ASJC) codes
- Computer Science Applications
- Electrical and Electronic Engineering