Low pressure chemical vapor deposition synthesis of hexagonal boron nitride on polycrystalline metal foils

The two-dimensional sp²-bonded material hexagonal boron nitride (h-BN) has unique electronic, thermal, mechanical, and chemical properties. It has recently found use as an ideal substrate for graphene-based electronic devices. We here describe synthesis of mono- to few-layer h-BN films using low pressure chemical vapor deposition (LPCVD) from borazine, with nickel, copper and platinum employed as catalytic substrates, and transfer of some of these fi{ligature}lms using a non-polymer method. Characterization of the films via Raman spectroscopy and transmission electron microscopy (TEM) is performed. Chemical vapor deposition synthesis of hexagonal boron nitride from borazine using metallic substrates.