Abstract
The crystallization temperature of Bi1.5 Zn0.5 Nb1.5 O6.5 (BZN) films was reduced by a combination of conventional heating and irradiation with a pulsed KrF excimer laser. Both the energy density and substrate temperature affect the properties of laser-annealed BZN films. It was found that the crystallinity and dielectric properties improved after a postannealing at 400 °C for 2 h in an oxygen atmosphere. BZN films crystallized with an energy density of 27 mJ cm2 at a substrate temperature of 400 °C with postannealing showed dielectric properties comparable to those of rapid thermal annealed BZN films. Laser crystallization at substrate temperatures ≤400 °C makes integration with polymeric substrates possible.
Original language | English (US) |
---|---|
Article number | 232905 |
Pages (from-to) | 1-3 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 87 |
Issue number | 23 |
DOIs | |
State | Published - 2005 |
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)