Abstract
The vapor species present in the deposition chamber during the vapor deposition of poly-para-xylylene (Parylene) thin films was analyzed using a differentially pumped quadrupole mass spectrometer (DPQMS). The partial pressure in the deposition chamber of volatile contamination originating in the dimer source, di-para-xylylene, was determined. The magnitude of the contamination was determined and its mass spectrum was analyzed using the DPQMS. Fragmentation patterns for the monomer were determined as a function of quadruple mass spectrometer (QMS) ionizing electron energy for energies ranging from 25 to 105 eV.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2459-2465 |
| Number of pages | 7 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 18 |
| Issue number | 5 |
| DOIs | |
| State | Published - Sep 2000 |
| Event | 47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA Duration: Oct 2 2000 → Oct 6 2000 |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films