Abstract
The net light pressure on a chiral sculptured thin film, for normal incidence, can be maximized by appropriately choosing the vapor incidence angle during the fabrication of the film by physical vapor deposition.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1407-1409 |
| Number of pages | 3 |
| Journal | Microwave and Optical Technology Letters |
| Volume | 49 |
| Issue number | 6 |
| DOIs | |
| State | Published - Jun 2007 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Electrical and Electronic Engineering