TY - JOUR
T1 - Measurements of Elastic Constants in Thin Films of Colossal Magnetoresistance Material
AU - So, Jin H.
AU - Gladden, J. R.
AU - Hu, Y. F.
AU - Maynard, J. D.
AU - Li, Qi
PY - 2003
Y1 - 2003
N2 - Measurements of elastic constants of strained 200 and 400 nm thin films, as well as unstrained samples, of the colossal magnetoresistance (CMR) material [Formula presented] are presented. Since the peak resistance temperature of a strained CMR film decreases as the film thickness decreases, it is of interest to see if features in the elastic constants, reflecting structural or magnetic changes, follow the peak resistance temperature. It is observed that features in the elastic constants appear not only at the peak resistance temperatures of the CMR samples, but also at a temperature about 17 K higher. A new technique, thin-film resonant ultrasound spectroscopy, was used to make the measurements.
AB - Measurements of elastic constants of strained 200 and 400 nm thin films, as well as unstrained samples, of the colossal magnetoresistance (CMR) material [Formula presented] are presented. Since the peak resistance temperature of a strained CMR film decreases as the film thickness decreases, it is of interest to see if features in the elastic constants, reflecting structural or magnetic changes, follow the peak resistance temperature. It is observed that features in the elastic constants appear not only at the peak resistance temperatures of the CMR samples, but also at a temperature about 17 K higher. A new technique, thin-film resonant ultrasound spectroscopy, was used to make the measurements.
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U2 - 10.1103/PhysRevLett.90.036103
DO - 10.1103/PhysRevLett.90.036103
M3 - Article
AN - SCOPUS:85038344139
SN - 0031-9007
VL - 90
SP - 4
JO - Physical review letters
JF - Physical review letters
IS - 3
ER -