Measurements of the reaction-diffusion front of model chemically amplified photoresists with varying photoacid size
- Bryan D. Vogt
- , Shuhui Kang
- , Vivek M. Prabhu
- , Eric K. Lin
- , Sushil K. Satija
- , Karen Turnquest
- , Wen Li Wu
Research output: Contribution to journal › Article › peer-review
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