Mechanisms of Passivity of Nonequilibrium Al-W Alloys

G. D. Davis, B. J. Rees, B. A. Shaw, M. Ferry

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Sputter-deposited Al-W alloys exhibit considerably enhanced resistance to pitting corrosion over a range of pHs extending from pH 0 to 9.6. Surface analysis showed that although very little oxidized W is found in the passive film at near-neutral pHs, at pH 3 there are comparable amounts of oxidized W and Al. A review of the different mechanisms proposed to explain the passivity of this class of alloys suggests that the pitting resistance of Al-W is likely to result from inhibition and repassivation of pits due to the stability of oxidized W in low-pH environments as described by the solute-rich interphase model (SRIM).

Original languageEnglish (US)
Pages (from-to)951-959
Number of pages9
JournalJournal of the Electrochemical Society
Issue number4
StatePublished - Apr 1993

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry


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