Abstract
Sputter-deposited Al-W alloys exhibit considerably enhanced resistance to pitting corrosion over a range of pHs extending from pH 0 to 9.6. Surface analysis showed that although very little oxidized W is found in the passive film at near-neutral pHs, at pH 3 there are comparable amounts of oxidized W and Al. A review of the different mechanisms proposed to explain the passivity of this class of alloys suggests that the pitting resistance of Al-W is likely to result from inhibition and repassivation of pits due to the stability of oxidized W in low-pH environments as described by the solute-rich interphase model (SRIM).
Original language | English (US) |
---|---|
Pages (from-to) | 951-959 |
Number of pages | 9 |
Journal | Journal of the Electrochemical Society |
Volume | 140 |
Issue number | 4 |
DOIs | |
State | Published - Apr 1993 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Renewable Energy, Sustainability and the Environment
- Surfaces, Coatings and Films
- Electrochemistry
- Materials Chemistry