Abstract
Sputter-deposited Al-W alloys exhibit considerably enhanced resistance to pitting corrosion over a range of pHs extending from pH 0 to 9.6. Surface analysis showed that although very little oxidized W is found in the passive film at near-neutral pHs, at pH 3 there are comparable amounts of oxidized W and Al. A review of the different mechanisms proposed to explain the passivity of this class of alloys suggests that the pitting resistance of Al-W is likely to result from inhibition and repassivation of pits due to the stability of oxidized W in low-pH environments as described by the solute-rich interphase model (SRIM).
| Original language | English (US) |
|---|---|
| Pages (from-to) | 951-959 |
| Number of pages | 9 |
| Journal | Journal of the Electrochemical Society |
| Volume | 140 |
| Issue number | 4 |
| DOIs | |
| State | Published - Apr 1993 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Renewable Energy, Sustainability and the Environment
- Surfaces, Coatings and Films
- Electrochemistry
- Materials Chemistry
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