Mems spatial light modulator for optical maskless lithography

V. A. Aksyuk; D. López; G. P. Watson; M. E. Simon; R. A. Cirelli; F. Pardo; F. Klemens; A. R. Papazian; C. Bolle; J. E. Bower; E. Ferry; W. M. Mansfield; J. Miner; T. W. Sorsch; D. Tennant

Mems spatial light modulator for optical maskless lithography

V. A. Aksyuk, D. López, G. P. Watson, M. E. Simon, R. A. Cirelli, F. Pardo, F. Klemens, A. R. Papazian, C. Bolle, J. E. Bower, E. Ferry, W. M. Mansfield, J. Miner, T. W. Sorsch, D. Tennant

Electrical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Scopus citations

Abstract

128x512 arrays of electrostatically actuated piston micromirrors with 3 um and 5 um individual pixels and 90% optical fill factor are realized using a polysilicon surface micromachining process with 5 structural layers and 130nm minimum features. To modulate Deep Ultraviolet (DUV) radiation for Optical Maskless Lithography application, continuously controlled vertical motion of 80nm is achieved at less than 4V. The micromirror response time is less than 10 microseconds. A wiring layer is used to actuate subarrays of up to 128x128 mirrors at the same time in linear gratings, checkerboards and other patterns.

Original language	English (US)
Title of host publication	2006 Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006
Editors	Thomas W. Kenny, Leland Spangler
Publisher	Transducer Research Foundation
Pages	11-14
Number of pages	4
ISBN (Electronic)	0964002469, 9780964002463
State	Published - 2006
Event	13th Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006 - Hilton Head Island, United States Duration: Jun 4 2006 → Jun 8 2006

Publication series

Name	Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop

Conference

Conference	13th Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006
Country/Territory	United States
City	Hilton Head Island
Period	6/4/06 → 6/8/06

All Science Journal Classification (ASJC) codes

Control and Systems Engineering
Electrical and Electronic Engineering
Hardware and Architecture

Cite this

Aksyuk, V. A., López, D., Watson, G. P., Simon, M. E., Cirelli, R. A., Pardo, F., Klemens, F., Papazian, A. R., Bolle, C., Bower, J. E., Ferry, E., Mansfield, W. M., Miner, J., Sorsch, T. W., & Tennant, D. (2006). Mems spatial light modulator for optical maskless lithography. In T. W. Kenny, & L. Spangler (Eds.), 2006 Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006 (pp. 11-14). (Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop). Transducer Research Foundation.

@inproceedings{13f755eac7ef4dd1af76d40ca17d7a00,

title = "Mems spatial light modulator for optical maskless lithography",

abstract = "128x512 arrays of electrostatically actuated piston micromirrors with 3 um and 5 um individual pixels and 90% optical fill factor are realized using a polysilicon surface micromachining process with 5 structural layers and 130nm minimum features. To modulate Deep Ultraviolet (DUV) radiation for Optical Maskless Lithography application, continuously controlled vertical motion of 80nm is achieved at less than 4V. The micromirror response time is less than 10 microseconds. A wiring layer is used to actuate subarrays of up to 128x128 mirrors at the same time in linear gratings, checkerboards and other patterns.",

author = "Aksyuk, {V. A.} and D. L{\'o}pez and Watson, {G. P.} and Simon, {M. E.} and Cirelli, {R. A.} and F. Pardo and F. Klemens and Papazian, {A. R.} and C. Bolle and Bower, {J. E.} and E. Ferry and Mansfield, {W. M.} and J. Miner and Sorsch, {T. W.} and D. Tennant",

note = "Publisher Copyright: {\textcopyright} 2006 TRF.; 13th Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006 ; Conference date: 04-06-2006 Through 08-06-2006",

year = "2006",

language = "English (US)",

series = "Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop",

publisher = "Transducer Research Foundation",

pages = "11--14",

editor = "Kenny, {Thomas W.} and Leland Spangler",

booktitle = "2006 Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006",

}

Aksyuk, VA, López, D, Watson, GP, Simon, ME, Cirelli, RA, Pardo, F, Klemens, F, Papazian, AR, Bolle, C, Bower, JE, Ferry, E, Mansfield, WM, Miner, J, Sorsch, TW & Tennant, D 2006, Mems spatial light modulator for optical maskless lithography. in TW Kenny & L Spangler (eds), 2006 Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006. Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop, Transducer Research Foundation, pp. 11-14, 13th Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006, Hilton Head Island, United States, 6/4/06.

Mems spatial light modulator for optical maskless lithography. / Aksyuk, V. A.; López, D.; Watson, G. P. et al.
2006 Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006. ed. / Thomas W. Kenny; Leland Spangler. Transducer Research Foundation, 2006. p. 11-14 (Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Mems spatial light modulator for optical maskless lithography

AU - Aksyuk, V. A.

AU - López, D.

AU - Watson, G. P.

AU - Simon, M. E.

AU - Cirelli, R. A.

AU - Pardo, F.

AU - Klemens, F.

AU - Papazian, A. R.

AU - Bolle, C.

AU - Bower, J. E.

AU - Ferry, E.

AU - Mansfield, W. M.

AU - Miner, J.

AU - Sorsch, T. W.

AU - Tennant, D.

PY - 2006

Y1 - 2006

N2 - 128x512 arrays of electrostatically actuated piston micromirrors with 3 um and 5 um individual pixels and 90% optical fill factor are realized using a polysilicon surface micromachining process with 5 structural layers and 130nm minimum features. To modulate Deep Ultraviolet (DUV) radiation for Optical Maskless Lithography application, continuously controlled vertical motion of 80nm is achieved at less than 4V. The micromirror response time is less than 10 microseconds. A wiring layer is used to actuate subarrays of up to 128x128 mirrors at the same time in linear gratings, checkerboards and other patterns.

AB - 128x512 arrays of electrostatically actuated piston micromirrors with 3 um and 5 um individual pixels and 90% optical fill factor are realized using a polysilicon surface micromachining process with 5 structural layers and 130nm minimum features. To modulate Deep Ultraviolet (DUV) radiation for Optical Maskless Lithography application, continuously controlled vertical motion of 80nm is achieved at less than 4V. The micromirror response time is less than 10 microseconds. A wiring layer is used to actuate subarrays of up to 128x128 mirrors at the same time in linear gratings, checkerboards and other patterns.

UR - http://www.scopus.com/inward/record.url?scp=85062339554&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85062339554&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:85062339554

T3 - Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop

SP - 11

EP - 14

BT - 2006 Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006

A2 - Kenny, Thomas W.

A2 - Spangler, Leland

PB - Transducer Research Foundation

T2 - 13th Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006

Y2 - 4 June 2006 through 8 June 2006

ER -

Aksyuk VA, López D, Watson GP, Simon ME, Cirelli RA, Pardo F et al. Mems spatial light modulator for optical maskless lithography. In Kenny TW, Spangler L, editors, 2006 Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head 2006. Transducer Research Foundation. 2006. p. 11-14. (Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop).

Mems spatial light modulator for optical maskless lithography

Abstract

Publication series

Conference

All Science Journal Classification (ASJC) codes

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