Metalorganic chemical vapor deposition Pb(Zr,Ti)O3 and selected lower electrode structures as a pathway to integrated piezoelectric microelectromechanical systems

Ing Shin Chen; Jeffrey F. Roeder; Dong Joo Kim; Jon Paul Maria; Angus I. Kingon

doi:10.1116/1.1401747

Metalorganic chemical vapor deposition Pb(Zr,Ti)O₃ and selected lower electrode structures as a pathway to integrated piezoelectric microelectromechanical systems

Ing Shin Chen, Jeffrey F. Roeder, Dong Joo Kim, Jon Paul Maria, Angus I. Kingon

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

The preparation of PZT thin films on silicon substrates by metallorganic chemical vapor deposition (MOCVD) method was discussed. The lower electrode structures compatiable with MOVCD of PZT were developed to prevent iridium silicidation and promote adhesion. The successful demonstration of high quality piezoelectric PZT by MOVCD on the lower electrode structures indicated the viability of MOVCD approach for providing a pathway to integrated piezoelectric micromachined devices.

Original language	English (US)
Pages (from-to)	1833-1840
Number of pages	8
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	19
Issue number	5
DOIs	https://doi.org/10.1116/1.1401747
State	Published - Sep 1 2001

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.1401747

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Chen, I. S., Roeder, J. F., Kim, D. J., Maria, J. P., & Kingon, A. I. (2001). Metalorganic chemical vapor deposition Pb(Zr,Ti)O₃ and selected lower electrode structures as a pathway to integrated piezoelectric microelectromechanical systems. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 19(5), 1833-1840. https://doi.org/10.1116/1.1401747

@article{9889d018315a49c1a3131c01e2b46a93,

title = "Metalorganic chemical vapor deposition Pb(Zr,Ti)O3 and selected lower electrode structures as a pathway to integrated piezoelectric microelectromechanical systems",

abstract = "The preparation of PZT thin films on silicon substrates by metallorganic chemical vapor deposition (MOCVD) method was discussed. The lower electrode structures compatiable with MOVCD of PZT were developed to prevent iridium silicidation and promote adhesion. The successful demonstration of high quality piezoelectric PZT by MOVCD on the lower electrode structures indicated the viability of MOVCD approach for providing a pathway to integrated piezoelectric micromachined devices.",

author = "Chen, {Ing Shin} and Roeder, {Jeffrey F.} and Kim, {Dong Joo} and Maria, {Jon Paul} and Kingon, {Angus I.}",

year = "2001",

month = sep,

day = "1",

doi = "10.1116/1.1401747",

language = "English (US)",

volume = "19",

pages = "1833--1840",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "5",

}

Chen, IS, Roeder, JF, Kim, DJ, Maria, JP & Kingon, AI 2001, 'Metalorganic chemical vapor deposition Pb(Zr,Ti)O₃ and selected lower electrode structures as a pathway to integrated piezoelectric microelectromechanical systems', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 5, pp. 1833-1840. https://doi.org/10.1116/1.1401747

Metalorganic chemical vapor deposition Pb(Zr,Ti)O₃ and selected lower electrode structures as a pathway to integrated piezoelectric microelectromechanical systems. / Chen, Ing Shin; Roeder, Jeffrey F.; Kim, Dong Joo et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 19, No. 5, 01.09.2001, p. 1833-1840.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Metalorganic chemical vapor deposition Pb(Zr,Ti)O3 and selected lower electrode structures as a pathway to integrated piezoelectric microelectromechanical systems

AU - Chen, Ing Shin

AU - Roeder, Jeffrey F.

AU - Kim, Dong Joo

AU - Maria, Jon Paul

AU - Kingon, Angus I.

PY - 2001/9/1

Y1 - 2001/9/1

N2 - The preparation of PZT thin films on silicon substrates by metallorganic chemical vapor deposition (MOCVD) method was discussed. The lower electrode structures compatiable with MOVCD of PZT were developed to prevent iridium silicidation and promote adhesion. The successful demonstration of high quality piezoelectric PZT by MOVCD on the lower electrode structures indicated the viability of MOVCD approach for providing a pathway to integrated piezoelectric micromachined devices.

AB - The preparation of PZT thin films on silicon substrates by metallorganic chemical vapor deposition (MOCVD) method was discussed. The lower electrode structures compatiable with MOVCD of PZT were developed to prevent iridium silicidation and promote adhesion. The successful demonstration of high quality piezoelectric PZT by MOVCD on the lower electrode structures indicated the viability of MOVCD approach for providing a pathway to integrated piezoelectric micromachined devices.

UR - http://www.scopus.com/inward/record.url?scp=0035441543&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035441543&partnerID=8YFLogxK

U2 - 10.1116/1.1401747

DO - 10.1116/1.1401747

M3 - Article

AN - SCOPUS:0035441543

SN - 1071-1023

VL - 19

SP - 1833

EP - 1840

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 5

ER -

Metalorganic chemical vapor deposition Pb(Zr,Ti)O₃ and selected lower electrode structures as a pathway to integrated piezoelectric microelectromechanical systems

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