Methods of patterned mist deposition of nano-crystalline quantum dot films

A. Sabeeh, Y. Thakur, J. H. Chao, A. Kshirsagar, Jerzy Ruzyllo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

This paper is concerned with patterning of ultra-thin films formed by means of mist deposition technique using colloidal solutions of nanocrystalline quantum dots (NQDs). It discusses patterns created using mechanical masks as well as area selective bottom-up growth of quantum dot films which follows patterns created by means of pre-mist deposition surface functionalization. A new method of nanocrystalline quantum dot film patterning by means of a lift-off process is proposed and investigated. The results obtained show effectiveness of both gas-phase (oxygen plasma) and liquid-phase (acetone) based lift-off steps in forming NQD patterns with the resolution defined by the resolution of the photolithographic process used to pattern photoresist.

Original languageEnglish (US)
Title of host publicationLow-Dimensional Nanoscale Electronic and Photonic Devices 7
EditorsS. W. Kim, Y. L. Chueh, S. Jin, Z. Fan, J. C. Ho, G. W. Hunter, M. Suzuki
PublisherElectrochemical Society Inc.
Pages1-5
Number of pages5
Volume64
Edition43
ISBN (Electronic)9781607685395
DOIs
StatePublished - Jan 1 2014
EventSymposium on Low-Dimensional Nanoscale Electronic and Photonic Devices 7 - 2014 ECS and SMEQ Joint International Meeting - Cancun, Mexico
Duration: Oct 5 2014Oct 9 2014

Other

OtherSymposium on Low-Dimensional Nanoscale Electronic and Photonic Devices 7 - 2014 ECS and SMEQ Joint International Meeting
Country/TerritoryMexico
CityCancun
Period10/5/1410/9/14

All Science Journal Classification (ASJC) codes

  • General Engineering

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