Metrology of thin adaptive optics for X-ray beamlines

  • Kenneth Buffo
  • , Casey DeRoo
  • , Philip Griffin
  • , Antoine Islegen-Wojdyla
  • , Xiaoya Chong
  • , Kenneth Goldberg
  • , Bryan Ochoa
  • , Susan Trolier-McKinstry
  • , Pannawit Tipsawat

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The generational advances in synchrotron radiation sources have historically been bottlenecked by the optics used to focus and manipulate X-ray beamlines. Such optics have strict metrology requirements while needing to be versatile in their abundance of applications. To meet these requirements, thin adaptive optics (TAOs) have been developed to correct optical surface error and perform source wavefront shaping. These TAOs consist of a series of thin-film piezoelectric actuators deposited on a mirror substrate that induce spatially localized figure deformations. In this work, the fabrication and actuator performance of two TAO mirror segments are reported. These ∼ 0.5 mm thick optics have addressable actuators whose responses were measured using Fizeau interferometry. The individual actuator responses of the two TAOs induced a figure change peak-to-valley (PV) of 183 nm and 63 nm on average. Finally, the TAOs were used to measure the deflection of an optical laser under operation of their actuators. These laser deflections were shown to be repeatable under a phase-shifted measured period. The metrology characterization described in this work shows a promising future for TAO development in realizing figure correction and wavefront shaping in X-ray beamlines.

Original languageEnglish (US)
Title of host publicationAdvances in X-Ray/EUV Sources, Optics, and Components XX
EditorsAli M. Khounsary, Hidekazu Mimura
PublisherSPIE
ISBN (Electronic)9781510691483
DOIs
StatePublished - Sep 19 2025
Event20th Advances in X-Ray/EUV Sources, Optics, and Components - San Diego, United States
Duration: Aug 3 2025Aug 4 2025

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume13620
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

Conference20th Advances in X-Ray/EUV Sources, Optics, and Components
Country/TerritoryUnited States
CitySan Diego
Period8/3/258/4/25

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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