MgB2 thin films by hybrid physical-chemical vapor deposition

  • X. X. Xi
  • , A. V. Pogrebnyakov
  • , S. Y. Xu
  • , K. Chen
  • , Y. Cui
  • , E. C. Maertz
  • , C. G. Zhuang
  • , Qi Li
  • , D. R. Lamborn
  • , J. M. Redwing
  • , Z. K. Liu
  • , A. Soukiassian
  • , D. G. Schlom
  • , X. J. Weng
  • , E. C. Dickey
  • , Y. B. Chen
  • , W. Tian
  • , X. Q. Pan
  • , S. A. Cybart
  • , R. C. Dynes

Research output: Contribution to journalReview articlepeer-review

Abstract

Hybrid physical-chemical vapor deposition (HPCVD) has been the most effective technique for depositing MgB2 thin films. It generates high magnesium vapor pressures and provides a clean environment for the growth of high purity MgB2 films. The epitaxial pure MgB2 films grown by HPCVD show higher-than-bulk Tc due to tensile strain in the films. The HPCVD films are the cleanest MgB2 materials reported, allowing basic research, such as on magnetoresistance, that reveals the two-band nature of MgB2. The carbon-alloyed HPCVD films demonstrate record-high Hc2 values promising for high magnetic field applications. The HPCVD films and multilayers have enabled the fabrication of high quality MgB2 Josephson junctions.

Original languageEnglish (US)
Pages (from-to)22-37
Number of pages16
JournalPhysica C: Superconductivity and its Applications
Volume456
Issue number1-2
DOIs
StatePublished - Jun 1 2007

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Energy Engineering and Power Technology
  • Electrical and Electronic Engineering

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