Micro- and macroscopic modeling of sputter depth profiling

Dawid Maciazek, Robert J. Paruch, Zbigniew Postawa, Barbara J. Garrison

Research output: Contribution to journalArticlepeer-review

7 Scopus citations


A model for predicting depth profiles due to energetic particle bombardment based on the RMS roughness of the system and the sputtering yield is proposed. The model is an extension of the macroscopic transport model proposed previously [Tuccitto, N.; Zappala, G.; Vitale, S.; Torrisi, A.; Licciardello, A. J. Phys. Chem. C 2016, 120, 9263-9269]. The model is used to reconstruct the experimental depth profiles of a NiCr heterostructure due to bombardment by C60, SF5, O2, and Ga.

Original languageEnglish (US)
Pages (from-to)25473-25480
Number of pages8
JournalJournal of Physical Chemistry C
Issue number44
StatePublished - Nov 10 2016

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • General Energy
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films


Dive into the research topics of 'Micro- and macroscopic modeling of sputter depth profiling'. Together they form a unique fingerprint.

Cite this