TY - JOUR
T1 - Micro- and macroscopic modeling of sputter depth profiling
AU - Maciazek, Dawid
AU - Paruch, Robert J.
AU - Postawa, Zbigniew
AU - Garrison, Barbara J.
N1 - Funding Information:
The authors gratefully acknowledge the financial support from the National Science Foundation, Grant CHE-1212645, and the Polish National Science Center, Program 2013/09/B/ST4/ 00094.
Funding Information:
The authors gratefully acknowledge the financial support from the National Science Foundation, Grant CHE-1212645, and the Polish National Science Center, Program 2013/09/B/ST4/00094.
Publisher Copyright:
© 2016 American Chemical Society.
PY - 2016/11/10
Y1 - 2016/11/10
N2 - A model for predicting depth profiles due to energetic particle bombardment based on the RMS roughness of the system and the sputtering yield is proposed. The model is an extension of the macroscopic transport model proposed previously [Tuccitto, N.; Zappala, G.; Vitale, S.; Torrisi, A.; Licciardello, A. J. Phys. Chem. C 2016, 120, 9263-9269]. The model is used to reconstruct the experimental depth profiles of a NiCr heterostructure due to bombardment by C60, SF5, O2, and Ga.
AB - A model for predicting depth profiles due to energetic particle bombardment based on the RMS roughness of the system and the sputtering yield is proposed. The model is an extension of the macroscopic transport model proposed previously [Tuccitto, N.; Zappala, G.; Vitale, S.; Torrisi, A.; Licciardello, A. J. Phys. Chem. C 2016, 120, 9263-9269]. The model is used to reconstruct the experimental depth profiles of a NiCr heterostructure due to bombardment by C60, SF5, O2, and Ga.
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U2 - 10.1021/acs.jpcc.6b09228
DO - 10.1021/acs.jpcc.6b09228
M3 - Article
AN - SCOPUS:85042585766
SN - 1932-7447
VL - 120
SP - 25473
EP - 25480
JO - Journal of Physical Chemistry C
JF - Journal of Physical Chemistry C
IS - 44
ER -