Micro- and macroscopic modeling of sputter depth profiling

Dawid Maciazek; Robert J. Paruch; Zbigniew Postawa; Barbara J. Garrison

doi:10.1021/acs.jpcc.6b09228

Micro- and macroscopic modeling of sputter depth profiling

Dawid Maciazek
, Robert J. Paruch
, Zbigniew Postawa
, Barbara J. Garrison

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

A model for predicting depth profiles due to energetic particle bombardment based on the RMS roughness of the system and the sputtering yield is proposed. The model is an extension of the macroscopic transport model proposed previously [Tuccitto, N.; Zappala, G.; Vitale, S.; Torrisi, A.; Licciardello, A. J. Phys. Chem. C 2016, 120, 9263-9269]. The model is used to reconstruct the experimental depth profiles of a NiCr heterostructure due to bombardment by C₆₀, SF₅, O₂, and Ga.

Original language	English (US)
Pages (from-to)	25473-25480
Number of pages	8
Journal	Journal of Physical Chemistry C
Volume	120
Issue number	44
DOIs	https://doi.org/10.1021/acs.jpcc.6b09228
State	Published - Nov 10 2016

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
General Energy
Physical and Theoretical Chemistry
Surfaces, Coatings and Films

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10.1021/acs.jpcc.6b09228

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title = "Micro- and macroscopic modeling of sputter depth profiling",

abstract = "A model for predicting depth profiles due to energetic particle bombardment based on the RMS roughness of the system and the sputtering yield is proposed. The model is an extension of the macroscopic transport model proposed previously [Tuccitto, N.; Zappala, G.; Vitale, S.; Torrisi, A.; Licciardello, A. J. Phys. Chem. C 2016, 120, 9263-9269]. The model is used to reconstruct the experimental depth profiles of a NiCr heterostructure due to bombardment by C60, SF5, O2, and Ga.",

author = "Dawid Maciazek and Paruch, \{Robert J.\} and Zbigniew Postawa and Garrison, \{Barbara J.\}",

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doi = "10.1021/acs.jpcc.6b09228",

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T1 - Micro- and macroscopic modeling of sputter depth profiling

AU - Maciazek, Dawid

AU - Paruch, Robert J.

AU - Postawa, Zbigniew

AU - Garrison, Barbara J.

PY - 2016/11/10

Y1 - 2016/11/10

N2 - A model for predicting depth profiles due to energetic particle bombardment based on the RMS roughness of the system and the sputtering yield is proposed. The model is an extension of the macroscopic transport model proposed previously [Tuccitto, N.; Zappala, G.; Vitale, S.; Torrisi, A.; Licciardello, A. J. Phys. Chem. C 2016, 120, 9263-9269]. The model is used to reconstruct the experimental depth profiles of a NiCr heterostructure due to bombardment by C60, SF5, O2, and Ga.

AB - A model for predicting depth profiles due to energetic particle bombardment based on the RMS roughness of the system and the sputtering yield is proposed. The model is an extension of the macroscopic transport model proposed previously [Tuccitto, N.; Zappala, G.; Vitale, S.; Torrisi, A.; Licciardello, A. J. Phys. Chem. C 2016, 120, 9263-9269]. The model is used to reconstruct the experimental depth profiles of a NiCr heterostructure due to bombardment by C60, SF5, O2, and Ga.

UR - https://www.scopus.com/pages/publications/85042585766

UR - https://www.scopus.com/pages/publications/85042585766#tab=citedBy

U2 - 10.1021/acs.jpcc.6b09228

DO - 10.1021/acs.jpcc.6b09228

M3 - Article

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SP - 25473

EP - 25480

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

IS - 44

ER -

Micro- and macroscopic modeling of sputter depth profiling

Abstract

All Science Journal Classification (ASJC) codes

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