Abstract
Polycrystalline Pb(ZrxTi1-x)O3 thin films with x = 0.6 and 1.0 were deposited at low temperatures (450-525 °C) on (111)Pt/Ti/SiO2/Si substrates by metalorganic chemical vapor deposition. The films were characterized by x-ray diffraction, electron microscopy, and electrical measurements. The texture of the films could be improved by using one of two template layers: PbTiO3 or TiO2. Electrical properties, including dielectric constants, loss tangents, polarization, coercive field, and breakdown field, were also examined. PbZrO3 films on Pt/Ti/SiO2/Si with a pseudocubic (110) orientation exhibited an electric-field-induced transformation from the antiferroelectric phase to the ferroelectric phase. The effect of varying processing conditions on the microstructure and electrical properties of the films is discussed.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1962-1971 |
| Number of pages | 10 |
| Journal | Journal of Materials Research |
| Volume | 15 |
| Issue number | 9 |
| DOIs | |
| State | Published - Sep 2000 |
All Science Journal Classification (ASJC) codes
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering