Microstructure and properties of PbZr_0.6Ti_0.4O₃ and PbZrO₃ thin films deposited on template layers

Keyphrases

• Silica 100%
• Microstructure 100%
• Electrical Properties 100%
• PbZrO3 100%
• Template Layer 100%
• Rutile 50%
• Electron Microscopy 50%
• Diffraction 50%
• Metal-organic Chemical Vapor Deposition (MOCVD) 50%
• Low Temperature 50%
• Breakdown Field 50%
• PbTiO3 50%
• Dielectric Constant 50%
• Si Substrate 50%
• Electric-field-induced 50%
• Coercive Field 50%
• Processing Conditions 50%
• Microstructure Properties 50%
• Constant Losses 50%
• Ferroelectric Phase 50%
• Electrical Measurements 50%
• Pseudo-cubic 50%
• Induced Transformations 50%
• Loss Tangent 50%
• Antiferroelectric Phase 50%

Material Science

• Film 100%
• Thin Films 100%
• Chemical Vapor Deposition 25%
• Electron Microscopy 25%
• Permittivity 25%
• Ferroelectric Material 25%
• Titanium Dioxide 25%