TY - JOUR
T1 - Mid-wave to near-IR optoelectronic properties and epsilon-near-zero behavior in indium-doped cadmium oxide
AU - Cleri, Angela
AU - Tomko, John
AU - Quiambao-Tomko, Kathleen
AU - Imperatore, Mario V.
AU - Zhu, Yanglin
AU - Nolen, J. Ryan
AU - Nordlander, Joshua
AU - Caldwell, Joshua D.
AU - Mao, Zhiqiang
AU - Giebink, Noel C.
AU - Kelley, Kyle P.
AU - Runnerstrom, Evan L.
AU - Hopkins, Patrick E.
AU - Maria, Jon Paul
N1 - Publisher Copyright:
© 2021 American Physical Society. US.
PY - 2021/3
Y1 - 2021/3
N2 - Indium-doped cadmium oxide (In:CdO) thin films exhibit tunable epsilon-near-zero (ENZ) modal frequencies across a wide spectral range, bridging the mid-wave and near-infrared (IR). In:CdO thin films are prepared by reactive cosputtering from metallic Cd and In targets using high-power impulse magnetron sputtering (HiPIMS) and radio frequency sputtering, respectively. Using this approach, CdO thin films with carrier concentrations ranging from 2.3×1019 to 4.0×1020cm-3 and mobilities ranging from 300 to 400cm2/Vs are readily achieved. UV-VIS absorption spectra are used to measure optical bandgap, revealing a Burstein-Moss shift of 0.58 eV across the doping range investigated. Optical measurements demonstrate the tunability of near-perfect plasmonic ENZ absorption across the mid-wave and into the near-IR spectral ranges by controlling the carrier concentration through doping, while tuning the film thickness for impedance matching. In comparison to other dopants that can be introduced to HiPIMS-deposited CdO, In offers the largest range of carrier concentrations while maintaining high mobility, thus allowing for the widest accessibility of the IR spectrum of a single plasmonic material grown by sputtering.
AB - Indium-doped cadmium oxide (In:CdO) thin films exhibit tunable epsilon-near-zero (ENZ) modal frequencies across a wide spectral range, bridging the mid-wave and near-infrared (IR). In:CdO thin films are prepared by reactive cosputtering from metallic Cd and In targets using high-power impulse magnetron sputtering (HiPIMS) and radio frequency sputtering, respectively. Using this approach, CdO thin films with carrier concentrations ranging from 2.3×1019 to 4.0×1020cm-3 and mobilities ranging from 300 to 400cm2/Vs are readily achieved. UV-VIS absorption spectra are used to measure optical bandgap, revealing a Burstein-Moss shift of 0.58 eV across the doping range investigated. Optical measurements demonstrate the tunability of near-perfect plasmonic ENZ absorption across the mid-wave and into the near-IR spectral ranges by controlling the carrier concentration through doping, while tuning the film thickness for impedance matching. In comparison to other dopants that can be introduced to HiPIMS-deposited CdO, In offers the largest range of carrier concentrations while maintaining high mobility, thus allowing for the widest accessibility of the IR spectrum of a single plasmonic material grown by sputtering.
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U2 - 10.1103/PhysRevMaterials.5.035202
DO - 10.1103/PhysRevMaterials.5.035202
M3 - Article
AN - SCOPUS:85104245584
SN - 2475-9953
VL - 5
JO - Physical Review Materials
JF - Physical Review Materials
IS - 3
M1 - 035202
ER -