@inproceedings{b960e9006c9c448fa23c87cc25d7f4a4,
title = "Mist deposition for TFT technology",
abstract = "In this work the process of mist deposition is explored as a method used to deposit organic semiconductors and gate dielectrics for TFTs. With an expanding use of TFTs in both electronic and photonic applications mist deposition offers advantages in terms of versatility, throughput and process cost. The method of mist deposition is first introduced and then example of results obtained with mist deposited dielectric and semiconductors thin films are discussed. copyright The Electrochemical Society.",
author = "K. Shanmugasundaram and Price, {S. C.} and K. Chang and Lee, {D. O.} and J. Ruzyllo",
year = "2006",
doi = "10.1149/1.2356361",
language = "English (US)",
series = "ECS Transactions",
publisher = "Electrochemical Society Inc.",
number = "8",
pages = "255--259",
booktitle = "Thin Film Transistor Technology",
edition = "8",
note = "Thin Film Transistor Technologies 8 - 210th Electrochemical Society Meeting ; Conference date: 29-10-2006 Through 03-11-2006",
}