Abstract
The feasibility of mist deposition in the formation of very thin films in advanced nanoelectronic and photonic manufacturing, using liquid precursors, is discussed. In both cases of photoresist and high-k dielectric processing, deposition is well controlled and produced uniform, mechanically coherent films, even in the ultrathin thickness regime. The method is independent of the shape of the substrate. Mist deposition has the potential to supplement spin-on process in those applications in which effectiveness of the latter will be determined.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 75-80 |
| Number of pages | 6 |
| Journal | Semiconductor International |
| Volume | 27 |
| Issue number | 12 |
| State | Published - Nov 2004 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Microbiology
- Condensed Matter Physics
- Electrical and Electronic Engineering