Mist deposition of micron-thick lead zirconate titanate films

Keyphrases

• Lead Zirconate Titanate Thin Films 100%
• Chemical Deposition 100%
• Liquid Source 100%
• Mist Deposition 100%
• PZT Film 80%
• Silicon Substrate 60%
• Alumina Substrate 40%
• Chamber Temperature 40%
• Nozzle 20%
• Room Temperature 20%
• Thick Film 20%
• Ferroelectric Thin Film 20%
• Hysteresis Measurements 20%
• Lead Zirconate Titanate 20%
• Remanent Polarization 20%
• Tensile Stress 20%
• Coefficient of Thermal Expansion 20%
• Memory Application 20%
• Microactuators 20%
• Polarization Hysteresis 20%
• Stoichiometry Control 20%
• Chemical Solution Deposition Process 20%
• Thick Sample 20%
• Integrated Passive Device 20%
• Conformality 20%
• Random Access Memory 20%

Engineering

• Titanate 100%
• Lead Zirconate 100%
• Chemical Deposition 100%
• Liquid Source 100%
• Silicon Substrate 60%
• Deposited Film 40%
• Aluminum Oxide 40%
• Room Temperature 20%
• Limiting Factor 20%
• Deposition Process 20%
• Process Time 20%
• Random Access Memory 20%
• Passive Component 20%
• Conformality 20%
• Coefficient of Expansion 20%
• High Tensile Stress 20%

Material Science

• Film 100%
• Lead Zirconate Titanate 100%
• Silicon 57%
• Aluminum Oxide 28%
• Thick Films 14%
• Thermal Expansion 14%
• Ferroelectric Thin Films 14%
• Solution (Chemistry) 14%
• Ultimate Tensile Strength 14%