Modification of Schottky barriers in silicon by reactive ion etching with NF₃

Keyphrases

• Schottky Barrier 100%
• Ion Energy 100%
• Reactive Ion Etching 100%
• Barrier Height 50%
• Schottky Barrier Modification 50%
• Silicon Surface 50%
• Energetic Ions 50%
• Schottky Barrier Height 50%
• Positive Surface Charge 50%
• Net Positive 50%
• Gas Plasma 50%

Material Science

• Silicon 100%
• Schottky Barrier 100%
• Reactive Ion Etching 100%
• Surface Charge 33%
• Surface (Surface Science) 33%